Introduction to Ktu S6 Ece Vlsi Module 2 Cvd Process Intro
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Ktu S6 Ece Vlsi Module 2 Cvd Process Intro Comprehensive Overview
KTU S6 VLSI Module 2 Etching Intro Explains the isolation technique of PN Junction Isolation. This is used in isolation of devices in ICs. This is the second in the series of the Isolation techniques LOCOS- Local Oxidation of Silicon.
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- Moving to the
- Brief explanation in metal deposition.
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